Performance Enhancement of NCFETs via Non-Uniform Interfacial Oxide and Dual-Work-Function Gate Engineering

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dc.contributor.authorSingh, Utkarsh
dc.contributor.supervisorSharma, Rajneesh
dc.date.accessioned2026-09-04T04:44:37Z
dc.date.issued2026-09-04
dc.identifier.urihttps://hdl.handle.net/10266/7344
dc.language.isoen
dc.subjectNegative Capacitance FET
dc.subjectFerroelectric
dc.subjectDouble Metal Gate
dc.subjectNon-Uniform Interfacil
dc.subjectNegative Capacitance
dc.titlePerformance Enhancement of NCFETs via Non-Uniform Interfacial Oxide and Dual-Work-Function Gate Engineering
dc.typeThesis

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