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Home
Departments
Department of Electronics & Communication Engineering
Masters Theses@ECED
Performance Enhancement of NCFETs via Non-Uniform Interfacial Oxide and Dual-Work-Function Gate Engineering
Performance Enhancement of NCFETs via Non-Uniform Interfacial Oxide and Dual-Work-Function Gate Engineering
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6024620027_utkarshThesis_final.pdf
(726.54 KB)
Date
2026-09-04
Authors
Singh, Utkarsh
Supervisors
Sharma, Rajneesh
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Abstract
Description
Keywords
Negative Capacitance FET
,
Ferroelectric
,
Double Metal Gate
,
Non-Uniform Interfacil
,
Negative Capacitance
Citation
URI
https://hdl.handle.net/10266/7344
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Masters Theses@ECED
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