Design-analysis of Silicon based Photonic crystal waveguide for On-chip Slow Light Applications
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Abstract
Line-defect photonic crystal waveguides which is different from conventional dielectric
waveguides such as optical fiber are receiving considerable attention. Our proposed
waveguide structure is based on silicon photonics. Different optical components can be
connected with each other using proposed silicon waveguide to establish very fast
communication between circuit boards, between chips on a board, or even within single
chips.
A low-loss and flat dispersion line-defect photonic crystal waveguide is proposed based on
triangular lattice of two dimensional photonic crystals. Our main aim was to achieve flat
band slow light in silicon in a photonic crystal waveguide with large delay bandwidth
product and low GVD by shifting the positions of rows which are adjacent to the
waveguiding region. We propose two design approaches to design flat dispersion line defect
waveguide with low loss. In first set of approach, lattice constant value remains constant
throughout all proposed structures and in second set of approach, it is varied. A delaybandwidth
product (NDBP) with acceptably small group velocity dispersion in photonic
crystal waveguide is achieved. We proposed three structures by shifting the first two rows of
holes adjacent to the waveguide. Larger group index values of 36.16, 44.9 and 53.95 over flat
bandwidth of 15.7, 13.66 and 9.9 nm along with NDBP values of 0.351, 0.38 and 0.329 are
obtained. NDBP value is further improved by taking different lattice constant values for all
three structures and higher group indices 36.60, 46.52 and 54.58 over flat bandwidth of
18.82, 14.05 and 11.19 nm are reported. GVD parameter is also found to be low for all the
structures. The reported results can be useful in realizing flat band slow light in silicon with
improved waveguiding characteristics. To further test the practical applicability of our
waveguide the buffering capacity is calculated which is found to be as high as 140 bits. Both
the approaches are better from fabrication point of view as controlling the radius of holes at
nano-metre scale brings fabrication challenges. Generation of slow light is a promising
solution for buffering and time-domain processing of optical signals and also offers the
possibility for spatial compression of optical energy and the enhancement of linear and
nonlinear optical effects.
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